Chemical vapor deposition of nickel oxide films from Ni(C5H5)(2)/O-2

Nickel oxide films were deposited with Ni(C5H5)(2)(bis-cyclopentadienyl nic kel)/O-2 at various temperatures and O-2 flow rates. Gas phase reaction of Ni(C5H5)(2)/O-2 was observed above the temperature of 300 degreesC and a pe ak from CO2, the product of the Ni(C5H5)(2) oxidation, was observed. Pure o xide films were not obtained but a mixed phase of nickel, NiO and Ni2O3 was observed and the amount of each phase in the film depended on the depositi on condition. Films deposited at a high deposition temperature region (> 27 5 degreesC) had a high nickel content, and NiO(111) preferred crystal orien tation. Films deposited at a low deposition temperature region (< 275 degre esC) had low nickel content and NiO(200) preferred orientation. (C) 2001 El sevier Science B.V. All rights reserved.