Characterisation of Rh films deposited onto Al2O3 substrate by means of electron spectroscopy

Rh films were deposited step by step onto Al2O3 polycrystalline substrates. Distinct deposition conditions, especially the substrate temperature, were chosen to obtain the different growth modes. The deposit properties were s tudied by Auger electron spectroscopy (AES) and electron energy loss spectr oscopy (EELS). The energy of the Auger peak of deposited rhodium, the ratio of the substrate/deposit Auger signals and the shape of EELS curve were co mpared to characterise the metal deposit in situ. Conclusions drawn from th e electron spectroscopy methods were verified by means of transmission elec tron microscopy (TEM). Obtained results ought to be used to characterise th e metal deposits in situ, which can help to understand the gas adsorption m echanism. (C) 2001 Elsevier Science Ltd. All rights reserved.