Influence of ion energy and deposition temperature on the surface morphology of carbon films deposited by ion beams

Carbon films were deposited by mass-selected ion beam technique with ion en ergies 50-200eV at a substrate temperature from room temperature to 80 degr eesC,. For the energies used, smooth diamond-like carbon films were deposit ed at room temperature. When the substrate temperature was 600 degreesC,rou gh graphitic films were produced. But highly oriented carbon tubes were obs erved when the energies were larger than 140eV at 800 degreesC. They were p erpendicular to the surface and parallel to each other. preferred orientati on of graphite basic plane was observed by high-resolution electron microsc opy. Shallow ion implantation and stress are responsible for this orientati on.