Fabrication of strain-balanced Si/Si1-xGex multiple quantum wells on Si1-yGey virtual substrates and their optical properties

Citation
K. Kawaguchi et al., Fabrication of strain-balanced Si/Si1-xGex multiple quantum wells on Si1-yGey virtual substrates and their optical properties, APPL PHYS L, 79(3), 2001, pp. 344-346
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
3
Year of publication
2001
Pages
344 - 346
Database
ISI
SICI code
0003-6951(20010716)79:3<344:FOSSMQ>2.0.ZU;2-O
Abstract
Strain-balanced Si/SiGe multiple quantum wells (MQWs), which are designed t o overcome the limitation of the number of wells coming from the strain acc umulation, were fabricated, and their optical properties were investigated. X-ray diffraction spectra and cross-sectional transmission-electron-micros cope images showed a high-crystalline quality of samples and excellent unif ormity of the well width. Well-resolved no-phonon and TO-phonon-assisted tr ansitions from strain-balanced MQWs were observed by low-temperature photol uminescence spectroscopy, and both their temperature and excitation power d ependence showed blueshifts due to the delocalization of excitons, the band bending, and/or the band-filling effect. (C) 2001 American Institute of Ph ysics.