Atomic-scale characterization of a Co/AlOx/Co magnetic tunnel junction by scanning transmission electron microscopy

Citation
Mj. Plisch et al., Atomic-scale characterization of a Co/AlOx/Co magnetic tunnel junction by scanning transmission electron microscopy, APPL PHYS L, 79(3), 2001, pp. 391-393
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
3
Year of publication
2001
Pages
391 - 393
Database
ISI
SICI code
0003-6951(20010716)79:3<391:ACOACM>2.0.ZU;2-M
Abstract
Analytical electron microscopy has been employed to characterize the locali zed physical and electronic structure of a Co/AlOx/Co magnetic tunnel junct ion. The tunnel barrier is amorphous alumina with an extensive conduction b and tail due to disorder. Both barrier edges are Al terminated and an Al-ri ch layer exists at the bottom Co/AlOx interface. sp-d hybridization between interfacial Co and Al atoms is observed and it is likely that the interfac ial Al is metallic. All of these features are expected to be important to t he magnetoresistance behavior of the junction. (C) 2001 American Institute of Physics.