Anisotropic swelling of oblique-deposited SiO/SiO2 films in water vapors

Authors
Sekushin, NA Tolmachev, SN
Citation
Na. Sekushin et Sn. Tolmachev, Anisotropic swelling of oblique-deposited SiO/SiO2 films in water vapors, COLL J, 63(3), 2001, pp. 388-391
Citations number
6
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
COLLOID JOURNAL
ISSN journal
1061933X → ACNP
Volume
63
Issue
3
Year of publication
2001
Pages
388 - 391
Database
ISI
SICI code
1061-933X(200105/06)63:3<388:ASOOSF>2.0.ZU;2-I
Abstract
Due to anisotropic swelling of mixed SiO/SiO2 films induced by water adsorp tion, geometrically regular film buckling from the substrate was observed i n the form of linear spatially periodical structures with longitudinal orie ntation. The mechanical stresses in these films and geometry of the formed structures were studied. A mechanism was proposed to describe the observed deformation effect.