The impact of the thickness of the cobalt-silicide layer on the electrical
diode characteristics will be reported, with particular emphasis on the cur
rent-voltage (I-V) characteristics, the surface and bulk carrier recombinat
ion lifetime and the low-frequency noise. It is shown that for thicker sili
cides the generation-recombination of holes in the top n(+)-layer is enhanc
ed, giving rise to a higher diffusion current, an increase in the noise and
a larger surface recombination velocity. It is believed that these paramet
ers are closely linked, as the underlying physical phenomenon is the minori
ty carrier recombination. In addition, it is shown by transmission electron
microscopy that the silicide-silicon interface roughness is increased for
larger cobalt thickness, which may explain some of the observations. (C) 20
01 Kluwer Academic Publishers.