Electrical characterization of shallow cobalt-silicided junctions

Citation
E. Simoen et al., Electrical characterization of shallow cobalt-silicided junctions, J MAT S-M E, 12(4-6), 2001, pp. 207-210
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
12
Issue
4-6
Year of publication
2001
Pages
207 - 210
Database
ISI
SICI code
0957-4522(200106)12:4-6<207:ECOSCJ>2.0.ZU;2-C
Abstract
The impact of the thickness of the cobalt-silicide layer on the electrical diode characteristics will be reported, with particular emphasis on the cur rent-voltage (I-V) characteristics, the surface and bulk carrier recombinat ion lifetime and the low-frequency noise. It is shown that for thicker sili cides the generation-recombination of holes in the top n(+)-layer is enhanc ed, giving rise to a higher diffusion current, an increase in the noise and a larger surface recombination velocity. It is believed that these paramet ers are closely linked, as the underlying physical phenomenon is the minori ty carrier recombination. In addition, it is shown by transmission electron microscopy that the silicide-silicon interface roughness is increased for larger cobalt thickness, which may explain some of the observations. (C) 20 01 Kluwer Academic Publishers.