Dielectric properties of thin solid films formed on silicon

Citation
Pc. Fannin et al., Dielectric properties of thin solid films formed on silicon, J MAT S-M E, 12(4-6), 2001, pp. 347-350
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
12
Issue
4-6
Year of publication
2001
Pages
347 - 350
Database
ISI
SICI code
0957-4522(200106)12:4-6<347:DPOTSF>2.0.ZU;2-S
Abstract
We report on the measurement of the frequency-dependent complex permittivit y, epsilon (omega) = epsilon' (omega)-i epsilon"(omega), over the frequency range, 30MHz to 6 GHz, of silicon wafers and of thin dielectric films form ed on silicon. Measurements, as a function of temperature and time treatmen ts, were obtained by means of an HP Network Analyzer and dielectric probe a nd the resulting epsilon'(omega) and epsilon"(omega) plots for the silicon wafers are shown to have a Debye-type [1] profile, thereby indicating that the associated polarization mechanism is of the orientational variety. (C) 2001 Kluwer Academic Publishers.