Spectroscopic characteristics of SiO and SiO2 solid films: Assignment and local field effect influence

Authors
Shaganov, II Perova, TS Moore, RA Berwick, K
Citation
Ii. Shaganov et al., Spectroscopic characteristics of SiO and SiO2 solid films: Assignment and local field effect influence, J MAT S-M E, 12(4-6), 2001, pp. 351-355
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN journal
09574522 → ACNP
Volume
12
Issue
4-6
Year of publication
2001
Pages
351 - 355
Database
ISI
SICI code
0957-4522(200106)12:4-6<351:SCOSAS>2.0.ZU;2-0
Abstract
A number of thin SiOx (x=1, 2) films formed on silicon and reflection-absor ption substrates were investigated using infrared transmission and aluminiz ed glass techniques. The application of these techniques to SiO and SiO2 fi lms at normal and oblique incidence of light allows the observation of both the longitudinal and transverse optical phonons. The longitudinal-transver se optical phonon splitting is analyzed in terms of a dispersive local fiel d effect. (C) 2001 Kluwer Academic Publishers.