Photoelastic studies of residual stresses around fillers embedded in an epoxy matrix

Citation
A. Pawlak et al., Photoelastic studies of residual stresses around fillers embedded in an epoxy matrix, MACRO SYMP, 169, 2001, pp. 197-210
Citations number
8
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
MACROMOLECULAR SYMPOSIA
ISSN journal
10221360 → ACNP
Volume
169
Year of publication
2001
Pages
197 - 210
Database
ISI
SICI code
1022-1360(200105)169:<197:PSORSA>2.0.ZU;2-0
Abstract
A photoelastic method was used to investigate the residual stresses in ther moset matrices during curing and cooling generated around spherical and hig h shape ratio fillers modelled by glass beads and glass or carbon fibers,re spectively. Two types of reactive systems were selected: i/based on a stoic hiometric mixture of epoxy prepolymer and diamine comonomers -polycondensat ion-; ii! based on a mixture of epoxy prepolymer and an anhydride -chain po lymerization-, A mapping of the residual stresses was obtained after curing process and after hydrothermal aging. From such a method, the location of the maximal stresses and the extend of residual stresses field can be discu ssed as a function of the geometry of the inclusions, the nature of the mat rix, and the aging. The photoelastic method can be effective for various ty pes of fillers and polymer matrices in order to select the proper associati ons of components for composite materials.