Charge deep-level transient spectroscopy (Q-DLTS) and the feedback charge c
apacitance method (FCM) were applied to Al/intrinsic diamond/p-Si diodes, u
sing the top Al electrode as a Schottky gate. The Q-DLTS data recorded over
the temperature range of 90-450 K could be split into two components: (i)
a peak of the signal due to a discrete energy level, the hole emission of w
hich is thermally activated by DeltaE = 0.29 +/- 0.02 eV; (ii) a broad spec
trum of relaxation times manifesting itself as a signal that increases cont
inuously on heating the diodes toward the ultimate temperature. To exclude
any effects caused by the silicon back contact (Al), Q-DLTS spectra taken a
t different polarities of the filling pulse were compared. The related FCM
capacitance-voltage measurements at the uppermost temperature revealed no c
hanges in the capacitance with bias if sampling the time domain capacitance
in the microsecond region. Over a longer timescale an excess capacitance w
as detected as expected on the basis of the complementary Q-DLTS data. Taki
ng into account the absence of any capacitance changes at lower temperature
s and/or short observation times (excitation), it is concluded that the def
ects reside in the polycrystalline diamond layer rather than at the diamond
/silicon interface.