The gamma -Fe2O3 thin films were prepared by the reduction and the oxidatio
n of Fe-O thin films processed by plasma-enhanced chemical vapor deposition
(PECVD) technique. The phase transformation of Fe-O thin films was mainly
controlled by the substrate temperature and rf power. The Fe-O amorphous ph
ase was initially obtained at the deposition rf power over 150 W. The Fe-O
amorphous phase could be transformed into gamma -Fe2O3 phase under the cont
rolled reduction and oxidation at 280-320 degreesC. Based on the result of
sensing characteristics, the prepared gamma -Fe2O3 thin film showed the exc
ellent sensitivity to i-C4H10 and H-2 gas. The sensitivities of gamma -Fe2O
3 thin film to i-C4H10 and Hz gas were 60 and 90% in 500 ppm environments a
nd 76 and 96% in 3000 ppm environments, respectively. On the other hand, th
e Pt-addition to y-Fe2O3 thin film does not improve the gas sensitivity in
H-2 atmosphere. (C) 2001 Elsevier Science B.V. All rights reserved.