Atomic-layer chemical Vapor deposition of SnO2 for gas-sensing applications

SnO2 layers are grown from SnCl4 and H2O at 180-300 degreesC on quartz glas s substrates by atomic-layer-chemical-vapor-deposition-like process. The la yers are oxygen deficient, predominantly amorphous and contain chlorine res idues. Their amorphization degree decreases with the growth temperature. Al l the layers are sensitive to CO in air. Perfectly amorphous scanning-force -microscopy-smooth ultrathin (< 10 nm) layers are grown at 180 degreesC. Th e gas sensitivity of the latter paves the way for monograin-equivalent cond uctometric sensors; the presence of a massive uniformity is favorable for s ensor mechanisms studies. (C) 2001 Elsevier Science B.V. All rights reserve d.