Stoichiometry and microstructure effects on tungsten oxide chemiresistive films

Highly oriented tungsten trioxide thin films have been grown on (0 1 2) r-c ut sapphire substrates using reactive rf magnetron sputtering of a tungsten metal target in various oxygen/argon mixtures. Parameters for growth of st oichiometric tungsten trioxide (WO3) films were determined by X-ray photoel ectron spectroscopy (XPS). In situ four-point Van der Pauw conductivity mea surements were performed on as grown films and after post-deposition anneal ing to study changes in the oxygen vacancy population. Reflection high-ener gy electron diffraction (RHEED) and X-ray diffraction (XRD) indicate that s toichiometric WO3 films deposited at 450 degreesC are dominated by the tetr agonal phase with (0 0 1) orientation along the growth direction, and films deposited at 650 degreesC possess coexisting (0 0 2), (0 2 0), and (2 0 0) in-plane orientations of the monoclinic phase. Tetragonal and monoclinic-p hase WO3 films exhibit a change in conductivity of 0.1 Omega (-1) cm(-1) to 20 ppm H2S at 250 degreesC, but display different response kinetics. (C) 2 001 Elsevier Science B.V. All rights reserved.