In this paper, we present for the first time the compatibility of sol-gel m
ethod for SnO2 thin film preparation with the silicon technology for integr
ated gas sensor microfabrication. An integrated circuit (IC) compatible tes
t structure of medium power consumption equipped with boron-doped silicon h
eater and Au/W metallization is developed. The acid composition of the (liq
uid) sol phase, the thermal budget of sensing layer structuring, selective
wet etching of SnO2 sensing film, thickness uniformity and step coverage of
SnO2 sol-gel films are fitted with the requirement of above test structure
where metal layer is deposited before SnO2 film. Nanometric grain sizes of
undoped and antimony doped polycrystalline SnO2 films are obtained, as rev
ealed by XRD investigations. The AFM measurements of SnO2 thin films deposi
ted on existing Au/W metallization shown the excellent step coverage and mo
rphology of SnO2 films used for gas sensing applications. Low temperature g
as sensing properties of our SnO2 sol-gel derived thin films in reducing (C
H4, CH3COOH) and oxidizing (NO2) are preliminary reported by using our inte
grated test structure. (C) 2001 Elsevier Science B.V. All rights reserved.