The formation of developed morphology on the indium phosphide surface by ion argon beam sputtering

Citation
Ip. Soshnikov et al., The formation of developed morphology on the indium phosphide surface by ion argon beam sputtering, TECH PHYS, 46(7), 2001, pp. 892-896
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS
ISSN journal
10637842 → ACNP
Volume
46
Issue
7
Year of publication
2001
Pages
892 - 896
Database
ISI
SICI code
1063-7842(2001)46:7<892:TFODMO>2.0.ZU;2-4
Abstract
Self-organizing structures on the InP surface that are formed by ion-beam s puttering in the energy range 0.1-15 keV are investigated. It is shown that the processing of the InP surface by monochromatic argon beams can give ri se to the formation of two, "grass" and "cone-in-pit," morphologies. The fo rmation of the relief is treated in terms of a qualitative model including the processes of sputtering, cascade mixing, and surface transport. The mod el adequately predicts the fluence dependence of the density and size of mo rphological features. In addition, it enables one to clarify conditions und er which the morphologies form, as well as to explain the effect of target temperature on the demarcation line between the morphologies. It is demonst rated that the morphology may become anisotropic in the case of mask etchin g. In particular, the application of regularly spaced strips as masks makes it possible to produce a texture-like surface structure. (C) 2001 MAIK "Na uka/ Interperiodica".