Sd. Le Picard et al., The Si(P-3(J))+O-2 reaction: A fast source of SiO at very low temperature;CRESU measurements and interstellar consequences, ASTRON ASTR, 372(3), 2001, pp. 1064-1070
The rate coefficient of the reaction Si(P-3(J)) + O-2 --> SiO + O has been
measured at temperatures down to 15 K using a CRESU (Cinetique de Reaction
en Ecoulement Supersonique Uniforme) apparatus coupled with the PLP-LIF (Pu
lsed Laser Photolysis - Laser Induced Fluorescence) technique. The temperat
ure dependence of the rate coefficient is well fitted using the expression:
1.72 x 10(-10) (T/300 K)(-0.53) exp(-17 K/T) cm(3) molecule(-1) s(-1) in t
he temperature range 15-300 K. The silicon chemistry in interstellar clouds
is reviewed and possible consequences of our study are stressed.