U. Wennstrom et al., Early seedling growth of Pinus sylvestris after sowing with a mixture of stand and orchard seed in dense spacings, CAN J FORES, 31(7), 2001, pp. 1184-1194
Citations number
28
Categorie Soggetti
Plant Sciences
Journal title
CANADIAN JOURNAL OF FOREST RESEARCH-REVUE CANADIENNE DE RECHERCHE FORESTIERE
Effects on early seedling growth of seeding stand and orchard seed of Pinus
sylvestris L. in different mixtures (100, 75, 50, 25, and 0% of orchard se
ed) at 4-cm target spacing were quantified in one nursery and one field exp
eriment during a 2- and 5-year period, respectively. In the field experimen
t, 50% mixtures at 8- and 12-cm target spacing were also studied. Seedlings
from orchard seeds (OS) had in general higher growth rate than seedlings f
rom stand seed (SS). In the nursery experiment, OS were 25% taller, had 41%
larger above-soil biomass, and 18% larger root biomass than SS after 2 yea
rs when sown separately. However, root/shoot ratio was 26% less and the sle
nderness value (height/diameter ratio) was 11% greater for OS in comparison
with SS. Stand seed in high competition, compared with low competition (mi
xture 75% vs. mixture 0%), were 11% taller, had 15% greater slenderness val
ue, and 25% less root biomass after 2 years. OS had 9% greater slender valu
e in mixture 100% compared with the 25% mixture. In the field experiment, t
he tallest OS in each plot were 22% taller and the largest OS had 103% larg
er stem volume than the tallest or largest SS when sown separately after 5
years. After a height-selection thinning to one seedling per plot at year f
ive, 79% of the seedlings in 50% mixtures would be OS. Seedlings sown in 12
-cm spacing were 69% taller and had 527% larger stem volume than seedlings
in 4-cm spacing after 5 years. The investigation supports that orchard and
stand seed could be direct seeded in a mixture. Low dosages of the more exp
ensive orchard seeds could be used to obtain growth advantages. Stand seeds
should be added to increase the number of seedlings to the desired spacing
.