High-temperature operating 1.3-mu m quantum-dot lasers for telecommunication applications

Citation
F. Klopf et al., High-temperature operating 1.3-mu m quantum-dot lasers for telecommunication applications, IEEE PHOTON, 13(8), 2001, pp. 764-766
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
13
Issue
8
Year of publication
2001
Pages
764 - 766
Database
ISI
SICI code
1041-1135(200108)13:8<764:HO1MQL>2.0.ZU;2-I
Abstract
High-performance 1.3-mum-emitting quantum-riot lasers were fabricated by se lf-organized growth of InAs dots embedded in GaInAs quantum wells. The infl uence of the number of quantum-dot layers on the device performance was inv estigated. Best device results were achieved with six-dot layers. From the length dependence, a maximum ground state gain of 17 cm(-1) for six dot lay ers could be determined, Ridge waveguide lasers with a cavity length of 400 mum and high-reflection coatings show threshold currents of 6 mA and outpu t powers of more than 5 mW. Unmounted devices can be operated in continuous wave mode up to 85 degreesC. A maximum operating temperature of 160 degree sC was achieved in pulsed operation for an uncoated 2.5-mm-long ridge waveg uide laser.