CALCULATION OF 2P LEVELS FOR THERMAL DOUBLE DONORS IN SILICON

Authors
Citation
Lf. Makarenko, CALCULATION OF 2P LEVELS FOR THERMAL DOUBLE DONORS IN SILICON, Semiconductors, 31(8), 1997, pp. 819-822
Citations number
17
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
10637826
Volume
31
Issue
8
Year of publication
1997
Pages
819 - 822
Database
ISI
SICI code
1063-7826(1997)31:8<819:CO2LFT>2.0.ZU;2-V
Abstract
A two-center model is developed to explain the electronic structure of thermal double donors (TDD) in silicon. Calculations of 2p levels of singly ionized TDD's are performed in the effective mass approximation . From a comparison of the calculated results with the experimental da ta, the internuclear distance between the two electrically active atom s is evaluated as 0.75-0.95 nm for the TDD1-TDD3 and 1.35-1.75 nm for the next four species:TDD4-TDD7. (C) 1997 American Institute of Physic s.