Analyzing localized corrosion in ion-implanted metals via XPS/AES

Citation
Cf. Windisch et al., Analyzing localized corrosion in ion-implanted metals via XPS/AES, JOM-J MIN, 53(7), 2001, pp. 37-41
Citations number
33
Categorie Soggetti
Metallurgy
Journal title
JOM-JOURNAL OF THE MINERALS METALS & MATERIALS SOCIETY
ISSN journal
10474838 → ACNP
Volume
53
Issue
7
Year of publication
2001
Pages
37 - 41
Database
ISI
SICI code
1047-4838(200107)53:7<37:ALCIIM>2.0.ZU;2-V
Abstract
A combined electrochemical/surface analysis approach coupled with the use o f ion-implanted samples has bern successfully used to study anodic processe s relevant to intergranular stress corrosion cracking (IGSCC). Interpretati on of the data and applying it to an understanding of IGSCC varies in compl exity and difficulty with the system under study. In some cases, there is a direct correspondence between composition and corrosion rates while, in ot hers, the chemistry is more complex and secondary processes become dominant under some conditions. Nevertheless, the use of this approach has proved v aluable, at the very least providing a qualitative understanding of the int erplay between oxidation of a metal and the chemistry of segregants ar grai n boundaries that has forwarded modeling efforts on IGSCC.