Growth of thin Fe/Fe2O3 films on the Cu(110) surface

Citation
C. Pflitsch et al., Growth of thin Fe/Fe2O3 films on the Cu(110) surface, J APPL PHYS, 90(3), 2001, pp. 1215-1221
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
3
Year of publication
2001
Pages
1215 - 1221
Database
ISI
SICI code
0021-8979(20010801)90:3<1215:GOTFFO>2.0.ZU;2-O
Abstract
The growth of Fe/Fe-oxide double-layers on Cu(110) was studied with thermal energy atom scattering (TEAS), Auger electron spectroscopy, and low-energy electron diffraction (LEED). An iron film with a thickness of about 0.6 nm was evaporated at low temperature (130 K) on a smooth, well-ordered thin f ilm of Fe2O3 prepared on Cu(110). This Fe film is disordered. Ordering of t he film was observed at temperatures between 400 and 600 K. At 530 K, a str ucture corresponding to that of a well-ordered alpha -Fe(001) surface was o bserved with TEAS and LEED. Clear evidence was found for a mixing of the Fe and Fe2O3 layers at the interface, already beginning at the deposition tem perature of 130 K. With increasing temperature, the mixing of the Fe and Fe 2O3 layers became gradually more effective until, at around 600 K, it was e ssentially completed. Upon annealing the sample to 1000 K the structure of the film changes and a very thin (less than 2 ML) FeO film on top of the Cu (110) surface is obtained. (C) 2001 American Institute of Physics.