Good-optical-quality C delta-doped AlGaAs layers grown by metalorganic vapo
r phase epitaxy using CBr4 with the impurities confined over not more than
5 A and with doping levels above 1x10(12) cm(-2) are obtained. Such layers
are found to be adequate for use in the fabrication of nipi superlattices f
or amplitude modulation. Yet, little flexibility is found in the growth con
ditions, in particular for the V to III fluxes ratio, for obtaining such la
yers. (C) 2001 American Institute of Physics.