Av. Leont'Ev et al., Reaction of nitrogen(I) oxide with nitrogen-fixing systems on the basis oflithium, chlorotrimethylsilane, and transition metal compounds, RUSS J G CH, 71(6), 2001, pp. 905-906
Reaction of nitrogen(I) oxide with nitrogen-fixing systems Li/Me3SiCl/MCln
(MCln = CrCl3, CoCl2, Cp2TiCl2, FeCl3, CuCl2) was studied. In these systems
nitrogen(I) oxide, molecular nitrogen, and air nitrogen undergo reductive
silylation to tris(trimethylsilyl)amine. The efficiency of the process was
estimated by the molar ratio of the tris(trimethylsilyl)amine formed to met
al chloride MCln. The reaction of N2O with the nitrogen-fixing systems incl
uding CoCl2 and Cp2TiCl2 is not exhausted by the reduction of the former to
molecular nitrogen and its subsequent fixation by transition metal complex
es.