Effect of Si, Mg, and Mg-Zn doping on structural properties of a GaN layergrown by metalorganic chemical vapor deposition

Citation
Hk. Cho et al., Effect of Si, Mg, and Mg-Zn doping on structural properties of a GaN layergrown by metalorganic chemical vapor deposition, SOL ST ELEC, 45(12), 2001, pp. 2023-2027
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
45
Issue
12
Year of publication
2001
Pages
2023 - 2027
Database
ISI
SICI code
0038-1101(200112)45:12<2023:EOSMAM>2.0.ZU;2-K
Abstract
We have studied the structural properties of undoped, Si-doped, Mg-doped, a nd Mg-Zn codoped GaN using high-resolution X-ray diffraction (HRXRD) and tr ansmission electron microscopy. When compared with undoped GaN, the disloca tion density at the surface of the GaN layer decreases with Si doping and i ncreases with Mg doping. In addition, we observed a reduction of dislocatio n density by codoping with Zn atoms in the Mg-doped GaN layer. The full wid th at half maximum of HRXRD shows that Si doping and Mg-Zn codoping improve the structural quality of the GaN layer as compared with undoped and Mg-do ped GaN, respectively. (C) 2001 Elsevier Science Ltd. All rights reserved.