The influence of magnetic solenoid filtration on the property of (Ti-Al)N coatings deposited in a cathodic arc deposition system

Citation
Ms. Leu et al., The influence of magnetic solenoid filtration on the property of (Ti-Al)N coatings deposited in a cathodic arc deposition system, SURF COAT, 148(1), 2001, pp. 25-29
Citations number
13
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
148
Issue
1
Year of publication
2001
Pages
25 - 29
Database
ISI
SICI code
0257-8972(20011101)148:1<25:TIOMSF>2.0.ZU;2-3
Abstract
The magnetic solenoid filtration techniques (both d.c. and a.c. modes) are employed in the present study for elimination of macroparticles present in the coatings deposited by the cathodic arc deposition system. The influence of the magnetic filtration technique on the property of (Ti-Al)N coatings is investigated. Properties of the coatings evaluated in terms of surface r oughness, coating thickness, chemical composition and high temperature oxid ation resistance are compared with the base line data derived from coatings prepared from a conventional cathodic arc deposition system. The surface s moothness of the resultant coating is considerably improved by the magnetic solenoid filtration technique, with some sacrifice in coating thickness. T he a.c. magnetic solenoid filtration technique is observed to deliver the b est combination result of coating thickness and surface smoothness. The rel ative contents of aluminum, titanium and nitrogen in the coatings are also observed to vary with the mode of solenoid filtration techniques employed, i.e. a.c., d.c. or no solenoid applied. The variation of aluminum content i n (Ti-Al)N coating also demonstrates its effect in the property of high tem perature oxidation resistance. Ironically, (Ti-Al)N coatings deposited by t he conventional cathodic arc system performed best in terms of oxidation re sistance due to the retention of Al element in the coating. (C) 2001 Elsevi er Science B.V. All rights reserved.