Ny. Fogel et al., GIANT OSCILLATIONS OF COUPLING STRENGTH IN MO SI MULTILAYERS WITH CONSTANT SEMICONDUCTOR THICKNESS/, Physical review. B, Condensed matter, 56(5), 1997, pp. 2372-2375
We report the observation of anisotropy ratio gamma interlayer-couplin
g-strength oscillations with variation of metal-layer thickness in Mo/
Si multilayer series with constant Si-layer thickness. These oscillati
ons correlate with previously found oscillations of T-c, R-300/R-n, an
d dH(c perpendicular to)/dT. the giant amplitude or gamma oscillations
makes one believe that all oscillation effects are due to the variati
on of the Josephson coupling. The possible origin of these unusual eff
ects is discussed.