GIANT OSCILLATIONS OF COUPLING STRENGTH IN MO SI MULTILAYERS WITH CONSTANT SEMICONDUCTOR THICKNESS/

Citation
Ny. Fogel et al., GIANT OSCILLATIONS OF COUPLING STRENGTH IN MO SI MULTILAYERS WITH CONSTANT SEMICONDUCTOR THICKNESS/, Physical review. B, Condensed matter, 56(5), 1997, pp. 2372-2375
Citations number
19
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
56
Issue
5
Year of publication
1997
Pages
2372 - 2375
Database
ISI
SICI code
0163-1829(1997)56:5<2372:GOOCSI>2.0.ZU;2-B
Abstract
We report the observation of anisotropy ratio gamma interlayer-couplin g-strength oscillations with variation of metal-layer thickness in Mo/ Si multilayer series with constant Si-layer thickness. These oscillati ons correlate with previously found oscillations of T-c, R-300/R-n, an d dH(c perpendicular to)/dT. the giant amplitude or gamma oscillations makes one believe that all oscillation effects are due to the variati on of the Josephson coupling. The possible origin of these unusual eff ects is discussed.