Study of field electron emission spectral characteristics of amorphous carbon-nitride film

Citation
J. Chen et al., Study of field electron emission spectral characteristics of amorphous carbon-nitride film, ULTRAMICROS, 89(1-3), 2001, pp. 119-122
Citations number
12
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
89
Issue
1-3
Year of publication
2001
Pages
119 - 122
Database
ISI
SICI code
0304-3991(200110)89:1-3<119:SOFEES>2.0.ZU;2-N
Abstract
The study of field electron energy spectra from amorphous carbon-nitride (a -CN) films is essential to understand the mechanism of field emission from this promising material. In this work, the electron energy spectrum is stud ied by measuring the distribution of electron field emitted from individual emitting sites. The spectra are recorded at different electrical fields. I t is found that the peak shift as well as the half-width increase with incr easing applied fields. Furthermore, multi-peak features are observed at the low-energy side of the spectra. It is assumed that these peaks might origi nate from the interband states of a-CN film. We propose that although the e mission mainly originates from current injection into conduction band of a- CN film, the electrons may also be emitted from interband states. (C) 2001 Elsevier Science BN. All rights reserved.