PHOTORESPONSE OF TB3-FILMS( DOPED PHOSPHOSILICATE THIN)

Authors
LEE BI CAO ZC SISK WN HUDAK J SAMUELS WD EXARHOS GJ
Citation
Bi. Lee et al., PHOTORESPONSE OF TB3-FILMS( DOPED PHOSPHOSILICATE THIN), Materials research bulletin, 32(9), 1997, pp. 1285-1292
Citations number
20
Categorie Soggetti
Material Science
Journal title
Materials research bulletin → ACNP
ISSN journal
00255408
Volume
32
Issue
9
Year of publication
1997
Pages
1285 - 1292
Database
ISI
SICI code
0025-5408(1997)32:9<1285:POTDPT>2.0.ZU;2-P
Abstract
Phosphosilicate ceramic was doped with Tb3+ using sol-gel technique to prepare thin films. The films were prepared by spin coating the phosp hosilicate sols on SiOx/indium-tin-oxide/glass substrates. The photocu rrent of the films at 355 nm laser excitation was observed. The photor esponse as a function of applied field and laser energy was linear and showed no sign of saturation. The films exhibited very stable photore sponse under a very high number of laser shots. (C) 1997 Elsevier Scie nce Ltd.