OXYNITRIDE PREPARED BY LIQUID-PHASE DEPOSITION

Using an aqueous solution of ammonia hydroxide aqua, hydrosilicofluori c acid and boric acid, an oxynitride film can be obtained. Using such a liquid phase deposition method, the growth rate and the refractive i ndex increase with the mole concentration of ammonia hydroxide aqua. A fter thermal anealing in nitrogen ambient the thickness decreases but the refractive index increases. This distribution of nitrogen atoms ac cumulate at the interface of oxynitride and silicon. A model is propos ed to explain it.