SI-O-SI ANGLE DISTRIBUTION IN AMORPHOUS SILICA CHARACTERIZED BY EXAFSMULTIPLE-SCATTERING CALCULATIONS

Authors
MOEN A LENOC L ON DT BONNEVIOT L LEVESQUE L ROY D
Citation
A. Moen et al., SI-O-SI ANGLE DISTRIBUTION IN AMORPHOUS SILICA CHARACTERIZED BY EXAFSMULTIPLE-SCATTERING CALCULATIONS, Journal de physique. IV, 7(C2), 1997, pp. 275-276
Citations number
8
Categorie Soggetti
Physics
Journal title
Journal de physique. IV → ACNP
ISSN journal
11554339
Volume
7
Issue
C2
Year of publication
1997
Part
1
Pages
275 - 276
Database
ISI
SICI code
1155-4339(1997)7:C2<275:SADIAS>2.0.ZU;2-C
Abstract
EXAFS-Multiple Scattering (MS) calculations has been performed to char acterize the second shell of neighbours around silicon in amorphous si lica. To render the large Si-O-Si angle distribution, a combination of three regular [(Si(OSi)(4)] structural models covering the 130 to 160 degrees angle range is used in the calculations.