PROBING THE MICROSTRUCTURE IN SEMICONDUCTOR LAYER MATERIALS USING SYNCHROTRON-RADIATION

Authors
Citation
Yh. Kao, PROBING THE MICROSTRUCTURE IN SEMICONDUCTOR LAYER MATERIALS USING SYNCHROTRON-RADIATION, Zhongguo wuli xuekan, 35(4), 1997, pp. 353-364
Citations number
17
Categorie Soggetti
Physics
Journal title
ISSN journal
05779073
Volume
35
Issue
4
Year of publication
1997
Pages
353 - 364
Database
ISI
SICI code
0577-9073(1997)35:4<353:PTMISL>2.0.ZU;2-2
Abstract
Advances in modern electronics and photonics depend crucially on techn ical capabilities to control the size, composition, and morphology of semiconductor layer structures. To exploit this important class of mat erials such as quantum wells and superlattices for technological appli cations, physical understanding of microscopic structures on the nanom eter scale is needed.