RELATIONSHIP BETWEEN CONTROL OF REACTIVE PLASMAS WITH MAGNETIC FILTERAND FORMATION OF THIN-FILMS

Plasma parameters (CH4/H-2 + Ar plasmas) are spatially well controlled using a movable magnetic filter. At any filter position, plasma param eters change dramatically across the magnetic filter. The plasma is di vided into two parts, the source plasma region (high density plasmas w ith energetic electrons) and the diffused plasma region (low electron- temperature plasmas without energetic electrons). Carbon thin films ar e prepared well in the diffused plasma region. The effects of bias pot ential of the substrate and control of neutral radicals on formation o f thin films are discussed briefly.