2-DIMENSIONAL FLUID MODEL OF RF PLASMAS IN SIH4 AR MIXTURES/

A self-consistent two dimensional numerical fluid model of rf plasmas under conditions close to those of the experiments for observing parti cle growth in silane rf plasmas has been developed. The geometry of th e discharge chamber and the electrodes used in the model is cylindrica lly symmetric: two cylinders for the electrodes are surrounded by the grounded chamber. The rf plasmas are in SiH4(10%)/Ar(90%) at a pressur e of 100 m Torr at 6.5 MHz. The results from the model, including the rf plasma structures and the generation rates for radicals, SiH, SiH2 and SiH3, are presented. Effects of the applied rf voltage and the sec ondary electron emission coefficient on the generation rates of the ra dicals are discussed.