DETERMINATION OF THE BONDING OF ALKYL MONOLAYERS TO THE SI(111) SURFACE USING CHEMICAL-SHIFT, SCANNED-ENERGY PHOTOELECTRON DIFFRACTION

The bonding of alkyl monolayers to Si(111) surfaces has been studied b y conventional x-ray photoelectron spectroscopy (XPS) and chemical-shi ft, scanned-energy photoelectron diffraction (FED) using synchrotron r adiation. Two very different wet-chemical methods have been used to pr epare the alkyl monolayers: (i) olefin insertion into the H-Si bond on the H-Si(111) surface, and (ii) replacement of Cl on the Cl-Si(111) s urface by an allyl group from an alkyllithium reagent. In both cases, XPS has revealed a C 1s signal chemically shifted to lower binding ene rgy, which we have assigned to carbon bonded to silicon. PED has shown that both preparative methods result in carbon bonded in an atop site with the expected C-Si bond length of 1.85+/-0.05 Angstrom. Chemical- shift, scanned-energy photoelectron diffraction is a particularly valu able probe of local structure at surfaces that contain the same elemen t in multiple, chemically distinct environments. (C) 1997 American Ins titute of Physics.