Cr. Laurens et al., SOFT-LANDING DEPOSITION OF MASS-SEPARATED RADIOACTIVE ISOTOPES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 129(3), 1997, pp. 429-435
In this paper we present a soft-landing ion deposition facility which
enables the deposition of mass-separated ions on surfaces with energie
s ranging from 1 to 3000 eV. The facility includes a UI-IV chamber sui
table for performing hyperfine interactions experiments on isolated pr
obe atoms located on the surface. Design and performance of the ion-de
celeration stage are described. We present Auger electron spectroscopy
and perturbed angular correlation data which demonstrate that the dep
osition process is chemically pure and that at sufficiently low deposi
tion energies no lattice damage is introduced in the surface layer.