SOFT-LANDING DEPOSITION OF MASS-SEPARATED RADIOACTIVE ISOTOPES

Citation
Cr. Laurens et al., SOFT-LANDING DEPOSITION OF MASS-SEPARATED RADIOACTIVE ISOTOPES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 129(3), 1997, pp. 429-435
Citations number
11
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
129
Issue
3
Year of publication
1997
Pages
429 - 435
Database
ISI
SICI code
0168-583X(1997)129:3<429:SDOMRI>2.0.ZU;2-V
Abstract
In this paper we present a soft-landing ion deposition facility which enables the deposition of mass-separated ions on surfaces with energie s ranging from 1 to 3000 eV. The facility includes a UI-IV chamber sui table for performing hyperfine interactions experiments on isolated pr obe atoms located on the surface. Design and performance of the ion-de celeration stage are described. We present Auger electron spectroscopy and perturbed angular correlation data which demonstrate that the dep osition process is chemically pure and that at sufficiently low deposi tion energies no lattice damage is introduced in the surface layer.