K. Ismail et al., INTEGRATED ENHANCEMENT-MODE AND DEPLETION-MODE FET IN MODULATION-DOPED SI SIGE HETEROSTRUCTURES/, IEEE electron device letters, 18(9), 1997, pp. 435-437
In this letter, we present results of enhancement and depletion mode t
ransistors fabricated on the same layer structure of Si/SiGe, without
using gate recess. The current in the enhancement mode device is contr
olled by a pn-junction, while that of the depletion-mode device is con
trolled by a Schottky barrier. A peak transconductance of 327 mS/mm an
d 417 mS/mm has been achieved in 0.5-mu m gate length depletion and en
hancement-mode transistors, respectively.