SPATIALLY-RESOLVED MINERAL DEPOSITION ON PATTERNED SELF-ASSEMBLED MONOLAYERS

Electron and ion beam lithographic techniques were used to pattern sel f-assembled monolayers with organic functional groups. Nucleation and growth of minerals from aqueous solution were confined to the patterne d regions. A vinyl-terminated self-assembled monolayer (SAM) was selec tively deposited in ion and electron beam etched regions of a methyl-t erminated SAM. Sulfonation of the vinyl groups produced a surface patt erned in either hydrophobic methyl groups or hydrophilic sulfonate gro ups. Subsequent growth of FeOOH films was confined to the sulfonated r egions. Condensation images were used to image each step in the lithog raphic scheme. Resolution of the SAM patterning step was 1-3 mum, whil e resolution of the mineral deposition step was 10-15 mum.