A SIMPLE ESTIMATE OF DEPOSITED ENERGY AND CONCENTRATION PROFILES IN FILMS PRODUCED BY ION-ASSISTED PHYSICAL VAPOR-DEPOSITION

Authors
GRIGOROV KG BOUCHIER D GRIGOROV GI VIGNES JL LANGERON JP
Citation
Kg. Grigorov et al., A SIMPLE ESTIMATE OF DEPOSITED ENERGY AND CONCENTRATION PROFILES IN FILMS PRODUCED BY ION-ASSISTED PHYSICAL VAPOR-DEPOSITION, Applied physics. A, Solids and surfaces, 58(6), 1994, pp. 619-622
Citations number
24
Categorie Soggetti
Physics, Applied
Journal title
Applied physics. A, Solids and surfaces → ACNP
ISSN journal
07217250
Volume
58
Issue
6
Year of publication
1994
Pages
619 - 622
Database
ISI
SICI code
0721-7250(1994)58:6<619:ASEODE>2.0.ZU;2-3
Abstract
Analytical expressions for estimating the energy dissipation and the f ilm constituent concentration profiles in films grown by Ion-Assisted Physical Vapour Deposition (IA PVD) are given. Two cases of IA PVD are considered: ion-assistance performed by inert-gas ions as well as by ions of a film constituent. As an example of application, concentratio n and damage depth profiles in h-BN films grown by IA PVD are calculat ed and a comparison is made with results obtained by computer simulati on.