EPITAXIAL BATIO3 FILMS GROWN BY AEROSOL MOCVD

Communication: BaTiO3 thin films are promising for electronic and opto electronic devices. Current growth techniques give rather low depositi on rates for practical applications. Here epitaxial growth rates over 100 times higher have been achieved using aerosol CVD with surface dif fusion enhancement in the presence of Bi-containing vapor. The AFM ima ge shows a typical layer with an rms roughness of 12 nm.