Wy. Lin et K. Rajeshwar, PHOTOCATALYTIC REMOVAL OF NICKEL FROM AQUEOUS-SOLUTIONS USING ULTRAVIOLET-IRRADIATED TIO2, Journal of the Electrochemical Society, 144(8), 1997, pp. 2751-2756
The photocatalytic removal of Ni(II) using ultraviolet (UV)-irradiated
TiO2 suspensions is described. The photocatalytic reaction is shown t
o be electron-mediated, and occurs both via direct electron transfer f
rom the photoexcited TiO2 particles to Ni(II), and an indirect route a
s described by previous authors. The latter requires the presence of a
n organic additive (acetate, formate, or methanol) that generates an i
ntermediate radical reductant via an initial hole-mediated reaction. T
he effects of inorganic anions (chloride, sulfate) on the rate of Ni(I
I) removal are described as are those of other variables including TiO
2 dose and solution pH. The direct electron-transfer route is shown to
be kinetically sluggish, although it can be made fast by the addition
of facile hole acceptors. The dark adsorption of Ni(II) on the TiO2 (
anatase) surface is also quantified in a chloride medium. The present
data are discussed within the framework of previous studies on the UV/
TiO2 photocatalytic deposition of Ni(II) and other metal ions.