Capacitive coupling from a current-flowing antenna to inductive rf pla
sma plays an important role not only in the discharge mechanism but al
so in the impurity release from materials around the antenna. As a res
ult of this coupling, there appears a large negative dc voltage (V(DC)
) on the surface of material which insulates the antenna conductor fro
m the plasma. The magnitude of V(DC) is directly measured as a functio
n of rf power, thickness of the insulating material, and the position
along the antenna. A simple model to describe the electrostatic antenn
a-plasma coupling is proposed. In addition, the effect of Faraday shie
lds on the inductively coupled rf discharge is presented.