ELECTROSTATIC COUPLING OF ANTENNA AND THE SHIELDING EFFECT IN INDUCTIVE RF PLASMAS

Citation
H. Sugai et al., ELECTROSTATIC COUPLING OF ANTENNA AND THE SHIELDING EFFECT IN INDUCTIVE RF PLASMAS, JPN J A P 1, 33(4B), 1994, pp. 2189-2193
Citations number
5
Categorie Soggetti
Physics, Applied
Volume
33
Issue
4B
Year of publication
1994
Pages
2189 - 2193
Database
ISI
SICI code
Abstract
Capacitive coupling from a current-flowing antenna to inductive rf pla sma plays an important role not only in the discharge mechanism but al so in the impurity release from materials around the antenna. As a res ult of this coupling, there appears a large negative dc voltage (V(DC) ) on the surface of material which insulates the antenna conductor fro m the plasma. The magnitude of V(DC) is directly measured as a functio n of rf power, thickness of the insulating material, and the position along the antenna. A simple model to describe the electrostatic antenn a-plasma coupling is proposed. In addition, the effect of Faraday shie lds on the inductively coupled rf discharge is presented.