MOLECULAR-BEAM MASS-SPECTROMETRY STUDIES OF CHEMICAL-VAPOR-DEPOSITIONOF DIAMOND

We have developed a novel molecular beam mass spectrometry technique t hat can quantitatively analyze the gas-phase composition in a chemical vapor deposition (CVD) reactor. The technique simultaneously monitors a wide variety of radical and stable species, and their concentration s can be determined with sensitivities approaching 1 ppm. Measurements performed in a diamond deposition system have provided keen insights into the important phenomena that affect the growth environment. In th is paper we first discuss the primary gas sampling design issues. In t he second part, details of the experimental results and their implicat ions are described.