Dg. Mcintyre et al., CHARACTERIZATION OF THE INFLUENCE OF FABRICATION METHODS ON MICROSTRUCTURE FAILURE, Sensors and actuators. A, Physical, 60(1-3), 1997, pp. 181-185
Single-crystal silicon microstructures, of identical design, exhibit d
ifferent failure rates (following fabrication or mechanical shock test
ing) due to various processes. The microstructures fabricated with a b
oron diffusion and subsequent removal of the boron-diffused layer have
a higher survival rate to the fabrication process and to mechanical s
hock. The survival rate (a survivor has an intact proof mass and beam)
through the process is increased by 26.5%. At a 3680g shock, the boro
n-diffused devices have a 2.3% lower failure rate but the difference i
s not statistically significant. These results have been developed wit
h wafer-level shock testing, which permits bulk testing of many sample
s in a cost-effective manner.