CHEMICAL CHARACTERIZATION OF NIST SILICATE GLASS CERTIFIED REFERENCE MATERIAL SRM-610 BY ICP-MS, TIMS, LIMS, SSMS, INAA, AAS AND PIXE

National Institute of Science and Technology (NIST) silicate glass SRM 610 is widely used as a certified reference material for various micr o-analytical techniques such as SIMS or laser ablation ICP-MS. SRM 610 has been nominally doped with sixty one trace elements at the 500 mu g g(-1) level, but certified concentration data exist for only a few o f these elements. This study reports concentration data for fifty nine trace elements obtained by ICP-MS, SSMS, LIMS, TIMS, INAA, AAS, and P IXE analyses of two different SRM 610 wafers. Most elements fall withi n a +/-10% band around a median value of about 440 mu g g(-1). The REE concentrations are shown to be constant to +/-3% (1 sigma), thus emph asizing the value of SRM 610 as a reference material for REE analyses. Comparison of our values with published data suggests that different SRM 610 wafers are, within errors, chemically identical for most eleme nts. Exceptions to this general rule appear to be restricted to elemen ts which were partly lost during the production of the glass, e.g. Ag and Br. On the basis of six independent determinations of Rb concentra tions, which are systematically lower by a few percent than the report ed NIST value, we argue that the certified Rb concentration may not be representative for all distributed SRM 610 wafers.