INSERTION REACTIONS OF TANTALUM(V) CARBORANE ALKYL AND ARYL COMPLEXESWITH NITRILES AND ISONITRILES - THERMAL AND PHOTOCHEMICAL ISOMERIZATION OF ETA(2)-IMINOACYL ISOMERS

Citation
E. Boring et al., INSERTION REACTIONS OF TANTALUM(V) CARBORANE ALKYL AND ARYL COMPLEXESWITH NITRILES AND ISONITRILES - THERMAL AND PHOTOCHEMICAL ISOMERIZATION OF ETA(2)-IMINOACYL ISOMERS, Organometallics, 16(18), 1997, pp. 3993-4000
Citations number
56
Categorie Soggetti
Chemistry Inorganic & Nuclear","Chemistry Inorganic & Nuclear
Journal title
ISSN journal
02767333
Volume
16
Issue
18
Year of publication
1997
Pages
3993 - 4000
Database
ISI
SICI code
0276-7333(1997)16:18<3993:IROTCA>2.0.ZU;2-B
Abstract
Tantalum carborane complexes (Et2C2B4H4)CpTaR2 (R = Me, Ph) undergo in sertion reactions with nitriles and isonitriles under conditions that differ from formally isoelectronic metallocene compounds of group 4 me tals. The dimethyltantalum system requires UV-vis irradiation, whereas the diphenyltantalum complex generally reacts at elevated temperature s. Although insertions of isonitriles into metal-alkyl bonds have been reported in a wide variety of cases, there are very few examples of s table isomeric eta(2)-iminoacyl intermediates that can be isolated and completely converted from one form into the other. Two such cases are reported here, including the X-ray crystallographic analysis of both isomers of (Et2C2B4H4)CpTaCH3(eta(2)-C,N-C{=N-t-Bu}CH3) (5a,5b) and on e isomer of H4)CpTaCH3(eta(2)-C,N-C{=N(2,6-Me2C6H3)}C6H5)(7a). Photoch emical isomerization of 7a, followed by exposure to an additional equi valent of isocyanide, resulted in a novel cage-insertion reaction to g ive Me2C6H3))]CpTa(eta(2)-C,N-C{=N-(2,6-Me2C6H3)}C6H5) (8), the crysta l structure of which was also determined. Stereoelectronic and steric factors that may contribute to the thermodynamic stability of N-out is omers of eta(2)-iminoacyl complexes are suggested, and data indicating the relatively electron-rich nature of the (carborane)(Cp))(TaR2)-R-V fragment is identified.