P. Wetzel et al., ORIGIN OF THE SEMIMETAL-TO-SEMICONDUCTOR TRANSITION OBSERVED IN 2-DIMENSIONAL ER SILICIDE UPON H EXPOSURE - EVIDENCE OF 2 CHEMISORPTION SITES, Surface science, 383(2-3), 1997, pp. 340-349
Chemisorption of atomic hydrogen on two-dimensional p(1 x 1) ErSi2 sil
icide epitaxially grown on Si(111) has been studied with angle-resolve
d photoemission (ARP) and high-resolution electron energy-loss spectro
scopy (HREELS). The existence of two H chemisorption sites correspondi
ng to Si-H and Er-H bonds in the ErSi2 silicide is clearly established
. These two sites per unit cell are found to be closely related and, f
or stability reasons, must be filled concomitantly rather than sequent
ially upon atomic H exposure. Their saturation explains the semimetal-
to-semiconductor transition observed upon adsorption of atomic H. (C)
1997 Elsevier Science B.V.