SAFE USAGE OF CIF3 - SUPPLY, VACUUM SERVICE, AND EXHAUST-GAS MANAGEMENT

Authors
PIERCE AM TAYLOR M SAUER J RUPPERT D
Citation
Am. Pierce et al., SAFE USAGE OF CIF3 - SUPPLY, VACUUM SERVICE, AND EXHAUST-GAS MANAGEMENT, Solid state technology, 40(9), 1997, pp. 107
Citations number
3
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
Solid state technology → ACNP
ISSN journal
0038111X
Volume
40
Issue
9
Year of publication
1997
Database
ISI
SICI code
0038-111X(1997)40:9<107:SUOC-S>2.0.ZU;2-K
Abstract
Chlorine trifluoride (CIF3) is a highly reactive process gas used in c hemical vapor deposition (CVD) and diffusion furnace applications for nonplasma cleans. Relatively new to US wafer manufacturers, CIF3 is an aggressive oxidizer. There is growing concern about safety, materials compatibility, and gas handling as CIF3 is increasingly used in semic onductor processing. Recent work in the laboratory and the field demon strates an effective, safe system for CIF3 supply, vacuum service, and abatement.