Chlorine trifluoride (CIF3) is a highly reactive process gas used in c
hemical vapor deposition (CVD) and diffusion furnace applications for
nonplasma cleans. Relatively new to US wafer manufacturers, CIF3 is an
aggressive oxidizer. There is growing concern about safety, materials
compatibility, and gas handling as CIF3 is increasingly used in semic
onductor processing. Recent work in the laboratory and the field demon
strates an effective, safe system for CIF3 supply, vacuum service, and
abatement.