INVESTIGATION OF IMPURITY DEPOSITION ON PLASMA-FACING COMPONENT USINGELECTRON-BEAM TECHNIQUE

Citation
Fc. Sze et al., INVESTIGATION OF IMPURITY DEPOSITION ON PLASMA-FACING COMPONENT USINGELECTRON-BEAM TECHNIQUE, Journal of nuclear materials, 246(2-3), 1997, pp. 165-170
Citations number
23
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
ISSN journal
00223115
Volume
246
Issue
2-3
Year of publication
1997
Pages
165 - 170
Database
ISI
SICI code
0022-3115(1997)246:2-3<165:IOIDOP>2.0.ZU;2-W
Abstract
In experiments in PISCES-B facility we have observed carbon film forma tion on beryllium substrates after hydrogen plasma exposure. The sourc es of the carbon are gaseous impurities in the vacuum system, which al so exist in a fusion reactor such as the International thermonuclear e xperimental reactor (ITER). Thin film formation, resulting from electr on-impurity interactions, is studied using a focused electron beam. In itial results show that carbon films are readily formed on beryllium s urface in a range of power densities from two kilowatts to over one me gawatt per square meter. Electron beam experiments on silicon and tung sten substrates, under the sane conditions, do not result in carbon fi lm formation. Microanalyses using scanning electron microscopy, Energy Dispersive X-ray spectroscopy and Raman are presented. (C) 1997 Elsev ier Science B.V.