Fc. Sze et al., INVESTIGATION OF IMPURITY DEPOSITION ON PLASMA-FACING COMPONENT USINGELECTRON-BEAM TECHNIQUE, Journal of nuclear materials, 246(2-3), 1997, pp. 165-170
Citations number
23
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
In experiments in PISCES-B facility we have observed carbon film forma
tion on beryllium substrates after hydrogen plasma exposure. The sourc
es of the carbon are gaseous impurities in the vacuum system, which al
so exist in a fusion reactor such as the International thermonuclear e
xperimental reactor (ITER). Thin film formation, resulting from electr
on-impurity interactions, is studied using a focused electron beam. In
itial results show that carbon films are readily formed on beryllium s
urface in a range of power densities from two kilowatts to over one me
gawatt per square meter. Electron beam experiments on silicon and tung
sten substrates, under the sane conditions, do not result in carbon fi
lm formation. Microanalyses using scanning electron microscopy, Energy
Dispersive X-ray spectroscopy and Raman are presented. (C) 1997 Elsev
ier Science B.V.