J. Fabian et Pb. Allen, THERMAL-EXPANSION AND GRUNEISEN PARAMETERS OF AMORPHOUS-SILICON - A REALISTIC MODEL CALCULATION, Physical review letters, 79(10), 1997, pp. 1885-1888
Using a realistic model, the mode Gruneisen parameters gamma and the t
emperature dependent coefficient of linear thermal expansion alpha(T)
are calculated for amorphous silicon. The resulting gamma values diffe
r from the crystalline case in having all diversity suppressed, except
for a minority of high-frequency localized and low-frequency resonant
modes. The latter have very large, mostly negative gamma (up to -31),
caused by volume-driven internal strain. As a result, the values for
alpha(T) are lower than those of crystalline silicon and are sample de
pendent.